US Patent 7732123 Immersion photolithography with megasonic rinse
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Patent abstract
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.
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US Patent 07732123 Immersion photolithography with megasonic rinse US Patent 7732123 Immersion photolithography with megasonic rinse
Infobox
Patent Number
0773212300
Patent Number
773212300
Edits on 27 Mar, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
077321230
Date of Patent
June 8, 2010
0Patent Application Number
109956530
Date Filed
November 23, 2004
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
077321230
Date of Patent
June 8, 2010
0Patent Application Number
109956530
Date Filed
November 23, 2004
0Official Website
Patent Primary Examiner
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US Patent 07732123 Immersion photolithography with megasonic rinse
Infobox
Is a
Patent jurisdiction
Patent number
07732123
Date of patent
June 8, 2010
Patent application number
10995653
Date Filed
November 23, 2004
Patent primary examiner
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