US Patent 7736439 Method for cleaning a polysilicon fraction
Patent 7736439 was granted and assigned to Wacker Chemie AG on June, 2010 by the United States Patent and Trademark Office.
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Patent abstract
The present invention relates to a method for cleaning polycrystalline silicon fragments to a metal content of <100 ppbw, wherein a polysilicon fraction is added to an aqueous cleaning solution containing HF and H2O2, this aqueous cleaning solution is removed and the polycrystalline fraction thereby obtained is washed with highly pure water and subsequently dried.
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Patent Inventor Names
Christian Gossmann0
Hanns Wochner0
Herbert Lindner0
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US Patent 07736439 Method for cleaning a polysilicon fraction US Patent 7736439 Method for cleaning a polysilicon fraction
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Patent Number
07736439
Patent Number
7736439
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Official Website
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US Patent 07736439 Method for cleaning a polysilicon fraction
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Is a
Current assignee
Patent jurisdiction
Patent number
07736439
Date of patent
June 15, 2010
Patent application number
11764246
Date Filed
June 18, 2007
Patent primary examiner
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