US Patent 7738119 Optical inspection system for a wafer
Patent 7738119 was granted and assigned to Seiko Instruments on June, 2010 by the United States Patent and Trademark Office.
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Patent abstract
Provided is an optical inspection system for a semiconductor wafer, by which a threshold value optimal for inspection can be determined and optical inspection of each chip can be performed based on the threshold value, by obtaining in advance a table indicating a relation between a film thickness of a thin film in specific positions in the wafer and a gradation value for each sample area in the chip, measuring the film thickness of the thin film in the specific positions of the wafer to be inspected before inspecting the chip, and comparing the measured film thickness with the gradation value in the table.
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US Patent 07738119 Optical inspection system for a wafer US Patent 7738119 Optical inspection system for a wafer
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Patent Number
0773811900
Patent Number
773811900
Edits on 21 May, 2023
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
077381190
Date of Patent
June 15, 2010
0Patent Application Number
120158490
Date Filed
January 17, 2008
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
077381190
Date of Patent
June 15, 2010
0Patent Application Number
120158490
Date Filed
January 17, 2008
0Official Website
Patent Primary Examiner
Edits on 3 Jun, 2022
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Website URL
Edits on 4 Dec, 2021
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US Patent 07738119 Optical inspection system for a wafer
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07738119
Date of patent
June 15, 2010
Patent application number
12015849
Date Filed
January 17, 2008
Patent primary examiner
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