US Patent 7743359 Apparatus and method for photomask design
Patent 7743359 was granted and assigned to Cadence Design Systems on June, 2010 by the United States Patent and Trademark Office.
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An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate than the first computational model.
US Patent 07743359 Apparatus and method for photomask design US Patent 7743359 Apparatus and method for photomask design
US Patent 07743359 Apparatus and method for photomask design
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