US Patent 7779781 Lithographic apparatus and device manufacturing method
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Patent abstract
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
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US Patent 07779781 Lithographic apparatus and device manufacturing method US Patent 7779781 Lithographic apparatus and device manufacturing method
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Patent Number
0777978100
Patent Number
777978100
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Official Website
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Is a
Patent Jurisdiction
Patent Number
077797810
Date of Patent
August 24, 2010
0Patent Application Number
109003940
Date Filed
July 28, 2004
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
077797810
Date of Patent
August 24, 2010
0Patent Application Number
109003940
Date Filed
July 28, 2004
0Official Website
Patent Primary Examiner
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US Patent 07779781 Lithographic apparatus and device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07779781
Date of patent
August 24, 2010
Patent application number
10900394
Date Filed
July 28, 2004
Patent primary examiner
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