Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Frederick T Chen0
Date of Patent
August 24, 2010
Patent Application Number
11613121
Date Filed
December 19, 2006
Patent Primary Examiner
Patent abstract
A method of photolithographic exposure is disclosed. The photolithographic exposure method comprises providing a substrate, forming a first resist layer thereon, forming a second resist layer on the first resist layer, the second resist layer providing a transmission which first increases then decreases as exposure dose increases, and exposing the second resist layer.
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