Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 7, 2010
Patent Application Number
12000100
Date Filed
December 7, 2007
Patent Primary Examiner
Patent abstract
A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
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