US Patent 7791709 Substrate support and lithographic process
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Patent abstract
A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part positioned around the central part. The substrate support further includes a thermal decoupler arranged to decrease heat transport between the central part and the peripheral part.
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US Patent 07791709 Substrate support and lithographic process US Patent 7791709 Substrate support and lithographic process
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Patent Number
0779170900
Patent Number
779170900
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Is a
Patent Jurisdiction
Patent Number
077917090
Date of Patent
September 7, 2010
0Patent Application Number
120001000
Date Filed
December 7, 2007
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
077917090
Date of Patent
September 7, 2010
0Patent Application Number
120001000
Date Filed
December 7, 2007
0Official Website
Patent Primary Examiner
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US Patent 07791709 Substrate support and lithographic process
Infobox
Is a
Patent jurisdiction
Patent number
07791709
Date of patent
September 7, 2010
Patent application number
12000100
Date Filed
December 7, 2007
Patent primary examiner
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