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US Patent 7794914 Chemically amplified positive resist composition

Patent 7794914 was granted and assigned to Sumitomo Chemical on September, 2010 by the United States Patent and Trademark Office.

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Patent abstract

The present invention provides a chemically amplified resist composition comprising:a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group,a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, andan acid generator.

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