US Patent 7794914 Chemically amplified positive resist composition
Patent 7794914 was granted and assigned to Sumitomo Chemical on September, 2010 by the United States Patent and Trademark Office.
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Patent abstract
The present invention provides a chemically amplified resist composition comprising:a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group,a resin (B) which contains a structural unit (b2) having a fluorine-containing group and at least one structural unit selected from a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure, andan acid generator.
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Patent Inventor Names
Ichiki Takemoto0
Nobuo Ando0
Yusuke Fuji0
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Official Website
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US Patent 07794914 Chemically amplified positive resist composition US Patent 7794914 Chemically amplified positive resist composition
Infobox
Patent Number
077949140
Patent Number
77949140
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
077949140
Date of Patent
September 14, 2010
0Patent Application Number
117051380
Date Filed
February 12, 2007
0Official Website
Patent Primary Examiner
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US Patent 07794914 Chemically amplified positive resist composition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07794914
Date of patent
September 14, 2010
Patent application number
11705138
Date Filed
February 12, 2007
Patent primary examiner
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