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US Patent 7795817 Controlled plasma power supply

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
November 21, 2007
Date of Patent
September 14, 2010
Patent Application Number
11944179
Patent Citations Received
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11699572 Feedback loop for controlling a pulsed voltage waveform
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US Patent 11776788 Pulsed voltage boost for substrate processing
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US Patent 11776789 Plasma processing assembly using pulsed-voltage and radio-frequency power
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US Patent 11791138 Automatic electrostatic chuck bias compensation during plasma processing
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US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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•••
Patent Inventor Names
Moritz Nitschke
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7795817
Patent Primary Examiner
Douglas W Owens
Douglas W Owens

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