Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yong Chiang Ee0
Juan Boon Tan0
Liang Choo Hsia0
Tong Qing Chen0
Bei Chao Zhang0
Bo Tao0
Chim Seng Seet0
Fan Zhang0
Date of Patent
September 28, 2010
0Patent Application Number
121962910
Date Filed
August 22, 2008
0Patent Primary Examiner
Patent abstract
A method for forming a semiconductor device is presented. The method includes providing a substrate prepared with a dielectric layer formed thereon. The dielectric layer having a conductive line disposed in an upper portion of the dielectric layer. The substrate is processed to produce a top surface of the dielectric layer that is not coplanar with a top surface of the conductive line to form a stepped topography.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
