US Patent 7806983 Substrate temperature control in an ALD reactor
Patent 7806983 was granted and assigned to Novellus Systems on October, 2010 by the United States Patent and Trademark Office.
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Patent abstract
A deposition system includes a process chamber for conducting an ALD process to deposit layers on a substrate. An electrostatic chuck (ESC) retains the substrate. A backside gas increases thermal coupling between the substrate and the ESC. The ESC is cooled via a coolant flowing through a coolant plate and heated via a resistive heater. Various arrangements are disclosed.
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US Patent 07806983 Substrate temperature control in an ALD reactor US Patent 7806983 Substrate temperature control in an ALD reactor
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Patent Number
0780698300
Patent Number
780698300
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
078069830
Date of Patent
October 5, 2010
0Patent Application Number
109216040
Date Filed
August 18, 2004
0Official Website
Patent Primary Examiner
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078069830
Date of Patent
October 5, 2010
0Patent Application Number
109216040
Date Filed
August 18, 2004
0Official Website
Patent Primary Examiner
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US Patent 07806983 Substrate temperature control in an ALD reactor
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07806983
Date of patent
October 5, 2010
Patent application number
10921604
Date Filed
August 18, 2004
Patent primary examiner
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