Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 5, 2010
Patent Application Number
12050589
Date Filed
March 18, 2008
Patent Primary Examiner
Patent abstract
A method of creating patterned objects using a class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I):
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