Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 5, 2010
Patent Application Number
11355192
Date Filed
February 16, 2006
Patent Primary Examiner
Patent abstract
A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.
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