US Patent 7825679 Dielectric film and layer testing
Patent 7825679 was granted and assigned to Infineon Technologies on November, 2010 by the United States Patent and Trademark Office.
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Patent abstract
A system for testing and a method for making a semiconductor device is disclosed. A preferred embodiment includes a conductor overlying a dielectric layer. The conductor is coupled to a first test pad via a first conducting line and to a second test pad via a second conducting line.
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US Patent 07825679 Dielectric film and layer testing US Patent 7825679 Dielectric film and layer testing
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Patent Number
0782567900
Patent Number
782567900
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078256790
Date of Patent
November 2, 2010
0Patent Application Number
124188430
Date Filed
April 6, 2009
0Official Website
Patent Primary Examiner
Edits on 27 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078256790
Date of Patent
November 2, 2010
0Patent Application Number
124188430
Date Filed
April 6, 2009
0Official Website
Patent Primary Examiner
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US Patent 07825679 Dielectric film and layer testing
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07825679
Date of patent
November 2, 2010
Patent application number
12418843
Date Filed
April 6, 2009
Patent primary examiner
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