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US Patent 7826698 Elimination of stitch artifacts in a planar illumination area

Patent 7826698 was granted and assigned to OREE (real estate company) on November, 2010 by the United States Patent and Trademark Office.

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Patent abstract

In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.

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