US Patent 7826698 Elimination of stitch artifacts in a planar illumination area
Patent 7826698 was granted and assigned to OREE (real estate company) on November, 2010 by the United States Patent and Trademark Office.
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Patent abstract
In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.
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Patent Inventor Names
Micha Zimmermann0
Noam Meir0
Yosi Shani0
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US Patent 07826698 Elimination of stitch artifacts in a planar illumination area US Patent 7826698 Elimination of stitch artifacts in a planar illumination area
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Patent Number
078266980
Patent Number
78266980
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Official Website
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Current Assignee
Patent Jurisdiction
Patent Number
078266980
Date of Patent
November 2, 2010
0Patent Application Number
127714110
Date Filed
April 30, 2010
0Official Website
Patent Primary Examiner
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US Patent 07826698 Elimination of stitch artifacts in a planar illumination area
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07826698
Date of patent
November 2, 2010
Patent application number
12771411
Date Filed
April 30, 2010
Patent primary examiner
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