US Patent 7832352 Coating treatment method and coating treatment apparatus
Patent 7832352 was granted and assigned to Tokyo Electron on November, 2010 by the United States Patent and Trademark Office.
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Patent abstract
To perform a series of resist coating treatments from application of a resist solution to removal of a resist film on a wafer edge portion in a shorter time.
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Patent Inventor Names
Takayuki Ishii0
Tomohiro Iseki0
Yoshiteru Fukuda0
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US Patent 07832352 Coating treatment method and coating treatment apparatus US Patent 7832352 Coating treatment method and coating treatment apparatus
Infobox
Patent Number
078323520
Patent Number
78323520
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
078323520
Date of Patent
November 16, 2010
0Patent Application Number
115748880
Date Filed
September 13, 2005
0Official Website
Patent Primary Examiner
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US Patent 07832352 Coating treatment method and coating treatment apparatus
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07832352
Date of patent
November 16, 2010
Patent application number
11574888
Date Filed
September 13, 2005
Patent primary examiner
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