Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 11, 2011
Patent Application Number
11813141
Date Filed
December 19, 2005
Patent Primary Examiner
Patent abstract
A polishing pad having a novel structure, which is applicable to highly accurate various polishing process, such as a CMP process, is provided. An annular rear plane groove (22) extending in a circumferential direction is formed on a rear plane (20) of the polishing pad.
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