Patent 7868305 was granted and assigned to Varian Semiconductor Equipment Associates on January, 2011 by the United States Patent and Trademark Office.
A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.