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US Patent 7871942 Methods for manufacturing high dielectric constant film

Patent 7871942 was granted and assigned to Applied Materials on January, 2011 by the United States Patent and Trademark Office.

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Patent abstract

Processes for making a high K (dielectric constant) film using an ultra-high purity hafnium containing organometallic compound are disclosed. Also described are devices incorporating high K films made with high purity hafnium containing organometallic compounds.

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