US Patent 7871942 Methods for manufacturing high dielectric constant film
Patent 7871942 was granted and assigned to Applied Materials on January, 2011 by the United States Patent and Trademark Office.
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Patent abstract
Processes for making a high K (dielectric constant) film using an ultra-high purity hafnium containing organometallic compound are disclosed. Also described are devices incorporating high K films made with high purity hafnium containing organometallic compounds.
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Patent Inventor Names
Khaled Z. Ahmed0
Pravin K. Narwankar0
Shreyas S. Kher0
Yi Ma0
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US Patent 07871942 Methods for manufacturing high dielectric constant film US Patent 7871942 Methods for manufacturing high dielectric constant film
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Patent Number
078719420
Patent Number
78719420
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Official Website
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
078719420
Date of Patent
January 18, 2011
0Patent Application Number
120571130
Date Filed
March 27, 2008
0Official Website
Patent Primary Examiner
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US Patent 07871942 Methods for manufacturing high dielectric constant film
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07871942
Date of patent
January 18, 2011
Patent application number
12057113
Date Filed
March 27, 2008
Patent primary examiner
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