Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Richard I. Seddon0
Robert E. Hahn0
Georg J. Ockenfuss0
Markus K. Tilsch0
Date of Patent
February 1, 2011
0Patent Application Number
111774650
Date Filed
July 8, 2005
0Patent Citations Received
0
Patent Primary Examiner
Patent abstract
A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
