US Patent 7879209 Cathode for sputter coating
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Patent abstract
A magnetron sputtering cathode for use in a vacuum deposition process is disclosed wherein the cathode is coated on its sides with an electrically insulating material such as alumina to prevent arcing, and wherein the first end surface of the cathode supports a material to be sputtered. The bottom of the cathode may also be coated with an electrically insulating coating or may be resting upon an insulating platform.
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Patent Inventor Names
Georg J. Ockenfuss0
Markus K. Tilsch0
Richard I. Seddon0
Robert E. Hahn0
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US Patent 07879209 Cathode for sputter coating US Patent 7879209 Cathode for sputter coating
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Patent Number
078792090
Patent Number
78792090
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Patent Jurisdiction
Patent Number
078792090
Date of Patent
February 1, 2011
0Patent Application Number
111774650
Date Filed
July 8, 2005
0Official Website
Patent Primary Examiner
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US Patent 07879209 Cathode for sputter coating
Infobox
Is a
Patent jurisdiction
Patent number
07879209
Date of patent
February 1, 2011
Patent application number
11177465
Date Filed
July 8, 2005
Patent primary examiner
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