Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kunihiro Oda0
Date of Patent
February 22, 2011
0Patent Application Number
105722520
Date Filed
October 20, 2004
0Patent Primary Examiner
Patent abstract
A tantalum sputtering target, wherein when the sum of the overall crystalline orientation is 1 on a tantalum target surface, the area ratio of crystals having any orientation among (100), (111), (110) does not exceed 0.5. Thus, obtained is a tantalum sputtering target having superior deposition properties where the deposition speed is high, film evenness (uniformity) is superior, and generation of arcings or particles is reduced.
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