US Patent 7894040 Lithographic apparatus and device manufacturing method
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Patent abstract
A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.
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Patent Inventor Names
Bob Streefkerk0
Johannes Catharinus Hubertus Mulkens0
Marcel Mathijs Theodore Marie Dierichs0
Matthew Lipson0
Roel De Jonge0
Ronald Wilklow0
Sjoerd Nicolaas Lambertus Donders0
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US Patent 07894040 Lithographic apparatus and device manufacturing method US Patent 7894040 Lithographic apparatus and device manufacturing method
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Patent Number
07894040
Patent Number
7894040
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Official Website
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US Patent 07894040 Lithographic apparatus and device manufacturing method
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Is a
Patent jurisdiction
Patent number
07894040
Date of patent
February 22, 2011
Patent application number
10957751
Date Filed
October 5, 2004
Patent primary examiner
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