Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 15, 2011
Patent Application Number
11226721
Date Filed
September 14, 2005
Patent Primary Examiner
Patent abstract
A rapid cooling system for a rapid thermal processing chamber includes a rapid thermal processing chamber having a wafer support for supporting a wafer. A tank having a supply of cooling liquid is provided in fluid communication with the chamber. A pump is provided in fluid communication with the rapid thermal processing chamber and the tank for pumping the cooling liquid from the tank to the chamber and cooling the wafer during the cooling phase of rapid thermal processing.
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