US Patent 7918712 Endpoint detection system for wafer polishing
Patent 7918712 was granted and assigned to Strasbaugh on April, 2011 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
February 12, 2010
Date of Patent
April 5, 2011
Patent Application Number
12705091
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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