Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ivo Raaijmakers0
Date of Patent
April 19, 2011
0Patent Application Number
123396720
Date Filed
December 19, 2008
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of self-aligned silicidation on structures having high aspect ratios involves depositing a metal oxide film using atomic layer deposition (ALD) and converting the metal oxide film to metal film in order to obtain uniform step coverage. The substrate is then annealed such that the metal in regions directly overlying the patterned and exposed silicon reacts with the silicon to form uniform metal silicide at the desired locations.
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