Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Futoshi Shimai0
Date of Patent
May 17, 2011
0Patent Application Number
117862030
Date Filed
April 11, 2007
0Patent Primary Examiner
Patent abstract
A heat treatment apparatus capable of ensuring a uniform temperature distribution on a substrate and reducing the generation of a sublimate includes a housing, a mounting table being arranged to move up and down within the housing, and a first heater being provided on the mounting table to heat a substrate placed on the mounting table, a second heater is provided on one side of the housing while an exhaust device is provided on the other side of the housing.
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