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US Patent 7967995 Multi-layer/multi-input/multi-output (MLMIMO) models and method for using

Patent 7967995 was granted and assigned to Tokyo Electron on June, 2011 by the United States Patent and Trademark Office.

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Patent abstract

The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.

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