Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sung Jin Kim0
Masato Tsuboi0
Minh-Van Ngo0
Shinich Imada0
Alexander Nickel0
Hieu Trung Pham0
Date of Patent
July 26, 2011
0Patent Application Number
122909160
Date Filed
November 5, 2008
0Patent Primary Examiner
Patent abstract
Prior to deposition of a silicon nitride (SiN) layer on a structure, a non-plasma enhanced operation is undertaken wherein the structure is exposed to silane (SiH4) flow, reducing the overall exposure of the structure to hydrogen radicals. This results in the silicon nitride being strongly bonded to the structure and in improved performance.
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