US Patent 8011296 Supercritical fluid-assisted direct write for printing integrated circuits
Patent 8011296 was granted and assigned to Micron Technology on September, 2011 by the United States Patent and Trademark Office.
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Patent abstract
High resolution patterns provided on a surface of a semiconductor substrate and methods of direct printing of such high resolution patterns are disclosed. The high resolution patterns may have dimensions less than 0.1 micron and are formed by a direct writing method employing a supercritical fluid comprising nanometer-sized particles, which may be optionally electrically charged.
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Patent Inventor Names
Cem Basceri0
Gurtej Sandhu0
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US Patent 08011296 Supercritical fluid-assisted direct write for printing integrated circuits US Patent 8011296 Supercritical fluid-assisted direct write for printing integrated circuits
Infobox
Patent Number
08011296
Patent Number
8011296
Edits on 8 Dec, 2021
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US Patent 08011296 Supercritical fluid-assisted direct write for printing integrated circuits
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Is a
Current assignee
Patent jurisdiction
Patent number
08011296
Date of patent
September 6, 2011
Patent application number
12232913
Date Filed
September 25, 2008
Patent primary examiner
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