Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akimitsu Ebihara0
Date of Patent
September 27, 2011
Patent Application Number
11785716
Date Filed
April 19, 2007
Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
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