Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Shinya Kikugawa0
Akio Koike0
Yasutomi Iwahashi0
Yuko Tachibana0
Date of Patent
January 10, 2012
0Patent Application Number
128690350
Date Filed
August 26, 2010
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
