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US Patent 8202681 Hybrid multi-layer mask
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Patent
Date Filed
July 21, 2011
Date of Patent
June 19, 2012
Patent Application Number
13188347
Patent Citations Received
US Patent 12009202 Using a self-assembly layer to facilitate selective formation of an etching stop layer
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US Patent 11748540 Method and structure for mandrel and spacer patterning
US Patent 11764286 Reducing parasitic capacitance for gate-all-around device by forming extra inner spacers
Patent Inventor Names
Fei-Gwo Tsai
0
Che-Rong Liang
0
Kuan-Liang Wu
0
Feng-Lung Lin
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
8202681
Patent Primary Examiner
Mark F. Huff
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