Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tah-Te Shih0
Date of Patent
August 7, 2012
0Patent Application Number
130714430
Date Filed
March 24, 2011
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for making a mask, in which, an imprinting lithography process is employed to form a pattern in a first region of a mask substrate, and an E-beam writing process is employed to form another pattern in a second region of the mask substrate. Furthermore, these two patterns may be well stitched through an optical alignment process in an E-beam writing chamber.
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