US Patent 8236464 Method for fabricating a mask
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Patent abstract
A method for making a mask, in which, an imprinting lithography process is employed to form a pattern in a first region of a mask substrate, and an E-beam writing process is employed to form another pattern in a second region of the mask substrate. Furthermore, these two patterns may be well stitched through an optical alignment process in an E-beam writing chamber.
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Patent Inventor Names
Tah-Te Shih0
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US Patent 08236464 Method for fabricating a mask US Patent 8236464 Method for fabricating a mask
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Patent Number
082364640
Patent Number
82364640
Edits on 27 Sep, 2022
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Is a
Patent Jurisdiction
Patent Number
082364640
Date of Patent
August 7, 2012
0Patent Application Number
130714430
Date Filed
March 24, 2011
0Patent Primary Examiner
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US Patent 08236464 Method for fabricating a mask
Infobox
Is a
Patent jurisdiction
Patent number
08236464
Date of patent
August 7, 2012
Patent application number
13071443
Date Filed
March 24, 2011
Patent primary examiner
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