US Patent 8242015 Film forming method and film forming apparatus
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Patent abstract
On a surface of an object to be treated, a Mn-containing thin film or CuMn-containing alloy thin film is formed by heat treatment (CVD or ALD) by using a Mn-containing source gas (or Mn-containing source gas and a Cu-containing gas) and an oxygen-containing gas (for instance, water vapor) as a processing gas. The Mn-containing thin film or the CuMn-containing alloy thin film can be formed with high step coverage in a fine recess formed on the surface of the object to be treated.
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Patent Inventor Names
Hitoshi Itoh0
Junichi Koike0
Kenji Matsumoto0
Koji Neishi0
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US Patent 08242015 Film forming method and film forming apparatus US Patent 8242015 Film forming method and film forming apparatus
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Patent Number
082420150
Patent Number
82420150
Edits on 28 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
082420150
Date of Patent
August 14, 2012
0Patent Application Number
126315560
Date Filed
December 4, 2009
0Patent Primary Examiner
Edits on 15 Dec, 2021
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US Patent 08242015 Film forming method and film forming apparatus
Infobox
Is a
Patent jurisdiction
Patent number
08242015
Date of patent
August 14, 2012
Patent application number
12631556
Date Filed
December 4, 2009
Patent primary examiner
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