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US Patent 8309440 Method and apparatus for cleaning a substrate surface

Patent 8309440 was granted and assigned to Applied Materials on November, 2012 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

83094400

Patent Inventor Names

David K. Carlson0

Johanes Swenberg0

Roisin L. Doherty0

Errol Antonio C. Sanchez0

Date of Patent

November 13, 2012

Patent Application Number

131754460

Date Filed

July 1, 2011

Patent Citations Received

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US Patent 11682560 Systems and methods for hafnium-containing film removal

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US Patent 11791141 System and method for residual gas analysis

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US Patent 11915950 Multi-zone semiconductor substrate supports

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US Patent 12009228 Low temperature chuck for plasma processing systems

Patent Primary Examiner

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Jack Chen

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