Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masato Kushibiki0
Eiichi Nishimura0
Fumiko Yamashita0
Date of Patent
February 26, 2013
0Patent Application Number
127210060
Date Filed
March 10, 2010
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate processing method processes a substrate including a processing target film, an organic film provided on the processing target film and having a plurality of line-shaped portions having fine width, and a hard film covering the line-shaped portions and the processing target film exposed between the line-shaped portions. The method includes a first etching step of etching a part of the hard film to expose the organic film and portions of the processing target film between the line-shaped portions; an ashing step of selectively removing the exposed organic film; and a second etching step of etching a part of the remaining hard film.
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