Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Vinh Hoang Luong0
Date of Patent
March 5, 2013
0Patent Application Number
129516910
Date Filed
November 22, 2010
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method for performing a selective etching process is described. The method includes preparing a substrate having a silicon layer (Si) and a silicon-germanium (SiGex) layer, and selectively etching the silicon layer relative to the silicon-germanium layer using a dry plasma etching process.
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