Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ching-Yu Chang0
Date of Patent
April 9, 2013
0Patent Application Number
130799420
Date Filed
April 5, 2011
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A photoresist material having a polymer that turns soluble to a base solution in response to reaction with acid. The material includes a photo-acid generator (PAG) that decomposes to form acid in response to radiation energy and a quencher capable of neutralizing acid and having a reduced mobility. The photoresist material can thereby prevent water mark defects from immersion lithography.
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