US Patent 8432529 Lithographic apparatus and monitoring method
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Patent abstract
A lithographic apparatus including a radiation beam monitoring apparatus, the radiation beam monitoring apparatus including an optical element configured to generate a diffraction pattern, and an imaging detector located after the optical element and not in a focal plane of the optical element such that the imaging detector is capable of detecting a mixture of spatial coherence and divergence of the radiation beam.
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Patent Inventor Names
Bert Jan Claessens0
Herman Philip Godfried0
Paul Van Der Veen0
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US Patent 08432529 Lithographic apparatus and monitoring method US Patent 8432529 Lithographic apparatus and monitoring method
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Patent Number
084325290
Patent Number
84325290
Edits on 1 Apr, 2023
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Infobox
Is a
Patent Jurisdiction
Patent Number
084325290
Date of Patent
April 30, 2013
0Patent Application Number
128224470
Date Filed
June 24, 2010
0Patent Primary Examiner
Edits on 16 Dec, 2021
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US Patent 08432529 Lithographic apparatus and monitoring method
Infobox
Is a
Patent jurisdiction
Patent number
08432529
Date of patent
April 30, 2013
Patent application number
12822447
Date Filed
June 24, 2010
Patent primary examiner
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