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US Patent 8432529 Lithographic apparatus and monitoring method
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Patent
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Date Filed
June 24, 2010
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Date of Patent
April 30, 2013
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Patent Application Number
12822447
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Patent Citations Received
US Patent 11686951 Reducing speckle in an excimer light source
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Patent Inventor Names
Paul Van Der Veen
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Bert Jan Claessens
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Herman Philip Godfried
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
8432529
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Patent Primary Examiner
Peter B. Kim
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