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US Patent 8475228 Polishing pad with partially recessed window

Patent 8475228 was granted and assigned to Applied Materials on July, 2013 by the United States Patent and Trademark Office.

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Patent abstract

A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.

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