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US Patent 8679354 Method of etching a sacrificial silicon oxide layer

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
0
Date Filed
August 2, 2007
0
Date of Patent
March 25, 2014
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Patent Application Number
12375745
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Patent Citations Received
‌
US Patent 11915950 Multi-zone semiconductor substrate supports
0
‌
US Patent 12009228 Low temperature chuck for plasma processing systems
0
Patent Inventor Names
Anthony O'Hara
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
8679354
0
Patent Primary Examiner
‌
Binh X Tran
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