Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bernabe J. Arruza0
Kenneth Gilbert Roessler0
Tod Evan Robinson0
Date of Patent
April 15, 2014
0Patent Application Number
136521140
Date Filed
October 15, 2012
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.
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