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US Patent 8696818 Debris removal in high aspect structures

Patent 8696818 was granted and assigned to Rave Llc on April, 2014 by the United States Patent and Trademark Office.

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Patent Citations Received
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US Patent 11964310 Debris removal from high aspect structures
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Patent Citations Received
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US Patent 11886126 Apparatus and method for removing a single particulate from a substrate
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Patent Citations Received
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US Patent 11874598 Method and apparatuses for disposing of excess material of a photolithographic mask
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Patent abstract

A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.

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Patent Inventor Names
Bernabe J. Arruza0
Kenneth Gilbert Roessler0
Tod Evan Robinson0
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US Patent 08696818 Debris removal in high aspect structures US Patent 8696818 Debris removal in high aspect structures

Infobox
Patent Number
086968180
Patent Number
86968180
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=086968180
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Infobox
Is a
Patent
Patent
0
Patent Applicant
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Rave Llc
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Current Assignee
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Rave Llc
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
086968180
Date of Patent
April 15, 2014
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Patent Application Number
136521140
Date Filed
October 15, 2012
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=086968180
Patent Primary Examiner
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Alexander Markoff
0
Edits on 19 Jun, 2022
"Entity importer update"
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=08696818
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 US Patent 08696818 Debris removal in high aspect structures

Infobox
Is a
Patent
Patent
Patent applicant
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Rave Llc
Current assignee
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Rave Llc
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08696818
Date of patent
April 15, 2014
Patent application number
13652114
Date Filed
October 15, 2012
Patent primary examiner
‌
Alexander Markoff

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